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dc.date.accessioned 2021-06-11T15:28:54Z
dc.date.available 2021-06-11T15:28:54Z
dc.date.issued 1994
dc.identifier.uri http://sedici.unlp.edu.ar/handle/10915/120122
dc.description.abstract Amorphous alloys (Co94.6P5.4 and Co71.6Ni Is18.3aP10.1) were prepared by the eleetroless teehnique. Oxide coated amorphous alloys were produced by applying a cyclic potential routine to the amorphous alloys immersed in alkaline solution at 30°C. Oxide coatings were character&d by electrochemical techniques and ir spectroscopy. The electrocatalytic activity of oxide coated amorphous alloy electrodes was tested for the oxygen evolution reaction in alkaline solution at 30°C. The high electrocatalytic activity of these electrodes is explained through the development of a porous hydrous oxide film with a spinel-type structure. en
dc.format.extent 1565-1569 es
dc.language en es
dc.subject Amorphous alloy es
dc.subject Electroless deposition es
dc.subject Oxide coating es
dc.subject Spine structures es
dc.subject Oxygen evolution reaction es
dc.title Electroless amorphous alloy electrodes en
dc.type Articulo es
sedici.title.subtitle The formation and properties of hydrous oxide coatings in alkaline solution en
sedici.creator.person Kessler, Teresita es
sedici.creator.person Podestá, José J. es
sedici.creator.person Piatti, Roberto C. V. es
sedici.creator.person Triaca, Walter Enrique es
sedici.subject.materias Ciencias Exactas es
sedici.subject.materias Química es
sedici.description.fulltext true es
mods.originInfo.place Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas es
sedici.subtype Articulo es
sedici.rights.license Creative Commons Attribution 4.0 International (CC BY 4.0)
sedici.rights.uri http://creativecommons.org/licenses/by/4.0/
sedici.description.peerReview peer-review es
sedici.relation.journalTitle Electrochimica Acta es
sedici.relation.journalVolumeAndIssue vol. 39, no. 11/12 es


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Creative Commons Attribution 4.0 International (CC BY 4.0) Excepto donde se diga explícitamente, este item se publica bajo la siguiente licencia Creative Commons Attribution 4.0 International (CC BY 4.0)