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dc.date.accessioned 2021-06-25T13:59:41Z
dc.date.available 2021-06-25T13:59:41Z
dc.date.issued 1993
dc.identifier.uri http://sedici.unlp.edu.ar/handle/10915/120781
dc.description.abstract The ellipsometric characteristics of relatively thick hydrous Pt oxide layers (HPtOLs) produced by oxidation- reduction cycling in the 0–2.4 V range in 1 M H2SO4, and the surface topography of electrodispersed Pt electrodes (EDPtEs) obtained by electroreducing the HPtOLs have been determined in the 400–700 nm range at 25 °C. The HPtOL is light absorbing and can be described as a layer made up of H2O and Pt oxide. The water content increases with increasing layer thickness, approaching a PttO2-to-H2O molar ratio of about 4. The EDPtE resulting from the slow electroreduction of HPtOL can be described as a rough structure with a metal-to-void ratio close to 0.5, which is consistent with a brush-like geometry. en
dc.format.extent 63-67 es
dc.language en es
dc.subject Pt oxide layers es
dc.subject Oxidation es
dc.title Ellipsometry of hydrous platinum oxide layers and electrodispersed platinum surfaces resulting from their electroreduction en
dc.type Articulo es
sedici.identifier.other https://doi.org/10.1016/0040-6090(93)90763-F es
sedici.identifier.issn 0040-6090 es
sedici.creator.person Zerbino, Jorge Omar es
sedici.creator.person Perdriel, Carlos L. es
sedici.creator.person Arvia, Alejandro Jorge es
sedici.subject.materias Ciencias Exactas es
sedici.subject.materias Química es
sedici.description.fulltext true es
mods.originInfo.place Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas es
sedici.subtype Articulo es
sedici.rights.license Creative Commons Attribution-NonCommercial-ShareAlike 4.0 International (CC BY-NC-SA 4.0)
sedici.rights.uri http://creativecommons.org/licenses/by-nc-sa/4.0/
sedici.description.peerReview peer-review es
sedici.relation.journalTitle Thin Solid Films es
sedici.relation.journalVolumeAndIssue vol. 232, no. 1 es


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Creative Commons Attribution-NonCommercial-ShareAlike 4.0 International (CC BY-NC-SA 4.0) Excepto donde se diga explícitamente, este item se publica bajo la siguiente licencia Creative Commons Attribution-NonCommercial-ShareAlike 4.0 International (CC BY-NC-SA 4.0)