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dc.date.accessioned 2021-08-10T15:25:00Z
dc.date.available 2021-08-10T15:25:00Z
dc.date.issued 1992
dc.identifier.uri http://sedici.unlp.edu.ar/handle/10915/122412
dc.description.abstract The pitting corrosion of copper in alkaline solutions in the presence of benzotriazole (BTA) was investigated. The presence of BTA shifts the breakdown (Eb) and the repassivating (Ep) potentials positively with respect to the blanks. However, the shift of Eb becomes smaller than that ofE b, particularly at pH9 and 11. Pitting corrosion involves the formation of crystallographic pits. The kinetics of the process fits a nucleation and growth mechanism involving instantaneous nucleation and 3D growth under charge transfer control. The spatial distribution of pits indicates that there is no marked influence of a pit on the nucleation and growth of other pits. en
dc.format.extent 1129–1134 es
dc.language en es
dc.subject Sodium es
dc.subject Copper es
dc.subject Physical Chemistry es
dc.subject Spatial Distribution es
dc.subject Charge Transfer es
dc.title Pitting corrosion of polycrystalline annealed copper in alkaline sodium perchlorate solutions containing benzotriazole en
dc.type Articulo es
sedici.identifier.uri https://link.springer.com/article/10.1007/BF01297413 es
sedici.identifier.other https://doi.org/10.1007/BF01297413 es
sedici.identifier.issn 1572-8838 es
sedici.identifier.issn 0021-891X es
sedici.creator.person Laz, M. M. es
sedici.creator.person Souto, R. M. es
sedici.creator.person González, S. es
sedici.creator.person Salvarezza, Roberto Carlos es
sedici.creator.person Arvia, Alejandro Jorge es
sedici.subject.materias Ciencias Exactas es
sedici.subject.materias Química es
sedici.description.fulltext true es
mods.originInfo.place Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas es
sedici.subtype Articulo es
sedici.rights.license Creative Commons Attribution 4.0 International (CC BY 4.0)
sedici.rights.uri http://creativecommons.org/licenses/by/4.0/
sedici.description.peerReview peer-review es
sedici.relation.journalTitle Journal of Applied Electrochemistry es
sedici.relation.journalVolumeAndIssue no. 22 es


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Creative Commons Attribution 4.0 International (CC BY 4.0) Excepto donde se diga explícitamente, este item se publica bajo la siguiente licencia Creative Commons Attribution 4.0 International (CC BY 4.0)