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dc.date.accessioned | 2021-08-10T15:25:00Z | |
dc.date.available | 2021-08-10T15:25:00Z | |
dc.date.issued | 1992 | |
dc.identifier.uri | http://sedici.unlp.edu.ar/handle/10915/122412 | |
dc.description.abstract | The pitting corrosion of copper in alkaline solutions in the presence of benzotriazole (BTA) was investigated. The presence of BTA shifts the breakdown (Eb) and the repassivating (Ep) potentials positively with respect to the blanks. However, the shift of Eb becomes smaller than that ofE b, particularly at pH9 and 11. Pitting corrosion involves the formation of crystallographic pits. The kinetics of the process fits a nucleation and growth mechanism involving instantaneous nucleation and 3D growth under charge transfer control. The spatial distribution of pits indicates that there is no marked influence of a pit on the nucleation and growth of other pits. | en |
dc.format.extent | 1129–1134 | es |
dc.language | en | es |
dc.subject | Sodium | es |
dc.subject | Copper | es |
dc.subject | Physical Chemistry | es |
dc.subject | Spatial Distribution | es |
dc.subject | Charge Transfer | es |
dc.title | Pitting corrosion of polycrystalline annealed copper in alkaline sodium perchlorate solutions containing benzotriazole | en |
dc.type | Articulo | es |
sedici.identifier.uri | https://link.springer.com/article/10.1007/BF01297413 | es |
sedici.identifier.other | https://doi.org/10.1007/BF01297413 | es |
sedici.identifier.issn | 1572-8838 | es |
sedici.identifier.issn | 0021-891X | es |
sedici.creator.person | Laz, M. M. | es |
sedici.creator.person | Souto, R. M. | es |
sedici.creator.person | González, S. | es |
sedici.creator.person | Salvarezza, Roberto Carlos | es |
sedici.creator.person | Arvia, Alejandro Jorge | es |
sedici.subject.materias | Ciencias Exactas | es |
sedici.subject.materias | Química | es |
sedici.description.fulltext | true | es |
mods.originInfo.place | Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas | es |
sedici.subtype | Articulo | es |
sedici.rights.license | Creative Commons Attribution 4.0 International (CC BY 4.0) | |
sedici.rights.uri | http://creativecommons.org/licenses/by/4.0/ | |
sedici.description.peerReview | peer-review | es |
sedici.relation.journalTitle | Journal of Applied Electrochemistry | es |
sedici.relation.journalVolumeAndIssue | no. 22 | es |