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dc.date.accessioned 2022-09-15T15:01:46Z
dc.date.available 2022-09-15T15:01:46Z
dc.date.issued 1988
dc.identifier.uri http://sedici.unlp.edu.ar/handle/10915/142114
dc.description.abstract The voltammetric behaviour of vitreous carbon/chemically precipitated silver hydroxide layer and silver/electrochemically formed silver oxide layer electrodes are compared. As the former type of electrode is free from silver substrate contributions during the oxidation-reduction cycles (ORC) the voltammetric data indicate the occurrence of soluble Ag(I) species in the gel-like silver hydroxide matrix. Soluble species can be formed during the ORC as a consequence of AgOH formation at the early stages of the oxidation and reduction processes. Nucleation and growth of new phases produce a non-homogeneous layer structure and a decrease in the amount of active material participating in the ORC under preset conditions. en
dc.format.extent 691-698 es
dc.language en es
dc.subject silver hydroxide layer es
dc.subject silver oxide layer es
dc.subject oxidation-reduction cycles es
dc.title Comparative voltammetric behaviour of the silver/silver oxide electrode prepared on vitreous carbon and silver substrates en
dc.type Articulo es
sedici.identifier.other doi:10.1007/bf01016894 es
sedici.identifier.issn 0021-891x es
sedici.identifier.issn 1572-8838 es
sedici.creator.person Lopez Teijelo, Manuel es
sedici.creator.person Vilche, Jorge Roberto es
sedici.creator.person Arvia, Alejandro Jorge es
sedici.subject.materias Química es
sedici.subject.materias Ciencias Exactas es
sedici.description.fulltext true es
mods.originInfo.place Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas es
sedici.subtype Articulo es
sedici.rights.license Creative Commons Attribution 4.0 International (CC BY 4.0)
sedici.rights.uri http://creativecommons.org/licenses/by/4.0/
sedici.description.peerReview peer-review es
sedici.relation.journalTitle Journal of Applied Electrochemistry es
sedici.relation.journalVolumeAndIssue vol. 18, no. 5 es


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Creative Commons Attribution 4.0 International (CC BY 4.0) Excepto donde se diga explícitamente, este item se publica bajo la siguiente licencia Creative Commons Attribution 4.0 International (CC BY 4.0)