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dc.date.accessioned 2022-11-18T13:28:20Z
dc.date.available 2022-11-18T13:28:20Z
dc.date.issued 2005-11-01
dc.identifier.uri http://sedici.unlp.edu.ar/handle/10915/146081
dc.description.abstract Surface-relief patterning of semiconductor surfaces has become a very active research topic during the last few years. This growing interest is related to the wide range of technological applications of patterned semiconductor surfaces, with particular emphasis on photovoltaic technology. In this work, we show a straightforward, cost-effective and non-hard lithographic approach for transferring surface-relief micropatterns on ZnO surfaces. The method is based on direct micromolding of pulsed-laser deposited ZnO films using surface-modified metallic micromolds. In contrast to those obtained by photolithographic techniques, direct micromolded ZnO surfaces are characterized by very low roughness values on the transferred relief patterns. en
dc.format.extent 1113-1116 es
dc.language en es
dc.subject Pulsed laser ablation deposition es
dc.subject Laser-assisted deposition es
dc.title Surface-relief micropatterning of zinc oxide substrates by micromolding pulsed-laser-deposited films en
dc.type Articulo es
sedici.identifier.other doi:10.1007/s00339-005-3298-x es
sedici.identifier.issn 0947-8396 es
sedici.identifier.issn 1432-0630 es
sedici.identifier.issn 1996-0948 es
sedici.creator.person Azzaroni, Omar es
sedici.creator.person Schilardi, Patricia Laura es
sedici.creator.person Salvarezza, Roberto Carlos es
sedici.creator.person Manuel-Herrero, J. es
sedici.creator.person Zaldo, Carlos es
sedici.creator.person Vázquez, Luis es
sedici.subject.materias Física es
sedici.description.fulltext true es
mods.originInfo.place Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas es
sedici.subtype Articulo es
sedici.rights.license Creative Commons Attribution-NonCommercial-ShareAlike 4.0 International (CC BY-NC-SA 4.0)
sedici.rights.uri http://creativecommons.org/licenses/by-nc-sa/4.0/
sedici.description.peerReview peer-review es
sedici.relation.journalTitle Applied Physics A es
sedici.relation.journalVolumeAndIssue vol. 81, no. 6 es


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Creative Commons Attribution-NonCommercial-ShareAlike 4.0 International (CC BY-NC-SA 4.0) Excepto donde se diga explícitamente, este item se publica bajo la siguiente licencia Creative Commons Attribution-NonCommercial-ShareAlike 4.0 International (CC BY-NC-SA 4.0)